Very higher purity silicon for semiconductors is acquired using the Siemens method; the silicon is reacted to create trichlorosilane, which happens to be initial purified by distillation, then reacted with purified hydrogen on large purity silicon rods at 1150 oC to yield higher purity, polycrystalline silicon with hydrochloric acid byproduct. https://eduardokieyu.ja-blog.com/36673097/5-simple-techniques-for-sic-abrasive